The New Jersey Institute of Technology's Electronic Theses & Dissertations Project

Levy, Roland A.
has served on the committee of
54 theses/dissertations that are available online.

* indicates that the advisor was committee chair or co-chair.

Author	Degree	Year		Title	ETD#
Xue, Huize	MS	© 2019	*	An electrical matlab model of plasma electrolytic oxidation	njit-etd2019-001
Rahim, Nilufa	PhD	© 2011		TiN/HfO2/SiO2/Si gate stacks reliability : Contribution of HfO2 and interfacial SiO2 layer	njit-etd2011-014
Suwattananont, Naruemon	PhD	© 2010	*	Multi-component boron coatings on low carbon steel AISI 1018	njit-etd2010-100
Chen, Weizhong	PhD	© 2008	*	Synthesis and characterization of plasma enhanced chemically vapor deposited tantalum films	njit-etd2008-059
Gu, Sipeng	PhD	© 2008	*	Synthesis and characterization of atmospheric pressure chemically vapor deposited aluminum	njit-etd2008-106
Payne, Joel A.	MS	© 2006		Characterization of thermally diffused bordie layers on AISI 1018 steel : residual stresses (by synchrotron radiation) and microhardness	njit-etd2006-104
Kundu, Tias	PhD	© 2005		Study of Si/SiO2 interface passivation and SiO2 reliability on deuterium implanted silicon	njit-etd2005-129
Li, Liwei	PhD	© 2004	*	Fabrication and characterization of microcrystalline silicon solar cells	njit-etd2004-027
Suh, Yong Seok	PhD	© 2004	*	Boron and phosphorous implantation into (100) germanium : modeling and investigation of dopant annealing behavior	njit-etd2004-097
Suwattananont, Naruemon	MS	© 2004		Surface treatment of ferrous alloys with boron	njit-etd2004-119
Behi, Mohammad	PhD	© 2001		High solid loading aqueous base metal/ceramic feedstock for injection molding	njit-etd2001-110
Luo, DianHong	PhD	© 2001	*	Development of an integrated photonic sensor for monitoring hazardous organics	njit-etd2001-102
Shah, Bhavin	MS	© 2001		Deposition of tantalum on steel by sputtering	njit-etd2001-008
Ramanuja, Narahari	PhD	© 2000	*	Synthesis and characterization of low pressure chemically vapor deposited boron nitride and titanium nitride films	njit-etd2000-029
Tungare, Mihir	MS	© 2000	*	Nanoporous SiO2/vycor membranes for air separation	njit-etd2000-007
Dharmadhikari, Sameer Narsinha	MS	© 1999	*	Low pressure chemical vapor deposition (LPCVD) of titanium nitride : synthesis and characterization	njit-etd1999-055
Shivaramkrishnan, Prabha	MS	© 1999		Characterization of tantalum coatings on steel substrates	njit-etd1999-012
Hussain, Muhammad A.	MS	© 1998	*	Development and characteristics of carbon nitride thin solid films for advanced coating applications	njit-etd1998-066
Kumar, Kiran	MS	© 1998	*	Synthesis and characterization of silicon dioxide films using diethyl silane and oxygen	njit-etd1998-070
Mitrofanov, Oleg	MS	© 1998	*	The In0.75Ga0.25As/In0.52Al0.48As/InP hall effect magnetic field sensor	njit-etd1998-077
Ramanuja, Narahari	MS	© 1998	*	Low pressure chemical vapor deposition of boron nitride thin films from triethylamine borane complex and ammonia	njit-etd1998-093
Vishwanathan, Sriram	MS	© 1998	*	Plasma enhanced chemical vapor deposition of diamondlike carbon films using acetylene	njit-etd1998-020
Aryusook, Krit	MS	© 1997	*	Trifluoroiodomethane as an environmentally friendly gas for water patterning by plasma etching process	njit-etd1997-040
Barone, Justin R.	MS	© 1997	*	Microporous silicon dioxide/vycor membranes for gas separation	njit-etd1997-041
Bhaskaran, Mahalingam	PhD	© 1997	*	Synthesis and characterization of LPCVD SiC films using novel precursors	njit-etd1997-044
Niyomwas, Sutham	MS	© 1997	*	Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition	njit-etd1997-079
Thongruang, Wiriya	MS	© 1997	*	Synthesis and characterization of hafnium carbide thin films	njit-etd1997-099
Wu, Hui	MS	© 1997	*	Synthesis and characterization of phosphosilicate glass films by LPCVD for sensor application	njit-etd1997-109
Xie, Lihui	MS	© 1997		Relaxation and the nature of electrical stress related defects in ultra-thin dioxide on silicon	njit-etd1997-110
Chatty, Kiran	MS	© 1996	*	Fabrication of integrated optic sensor to monitor pollutant concentration in effluents	njit-etd1996-048
Lee, Sung-Jun	MS	© 1996	*	Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition using ditertiarybutylsilane and oxygen	njit-etd1996-061
Li, Fenggang	PhD	© 1996		Experimental and numerical investigation of abrasive waterjet polishing technology	njit-etd1996-004
Li, Yufu	MS	© 1996		Effect of lamellar microstructure on the permeability of polyethylene films	njit-etd1996-064
Narayan, Manish	MS	© 1996	*	Characterization of low pressure chemically vapor deposited Boron Nitride films as low dielectric constant materials	njit-etd1996-070
Okojie, Robert Sylvester	PhD	© 1996		Characterization and fabrication of a (6H)-SiC as a piezoresistive pressure sensor for high temperature applications	njit-etd1996-016
Perese, David	MS	© 1996	*	Plasma enhanced chemical vapor deposition of stress free Tungsten films	njit-etd1996-077
Venkatesan, Vijayalakshmi	MS	© 1996	*	Low pressure chemical vapor deposition of silicon dioxide and phosphosilicate glass thin films	njit-etd1996-101
Chen, Hongyu	MS	© 1995	*	Low pressure chemical vapor deposition of tungsten as an absorber for x-ray masks	njit-etd1995-073
Chen, Lan	MS	© 1995	*	Synthesis and characterization of silicon dioxide thin films by plasma enhances chemical vapor deposition from diethylsilane and nitrous oxide	njit-etd1995-074
Datta, Abhijit	MS	© 1995	*	Synthesis of silicon oxide/VYCOR composite membrane structures by an optimized LPCVD process	njit-etd1995-078
King, Wei-Shang	MS	© 1995	*	Low pressure chemical vapor deposition of copper films from CU(I)(HFAC)(TMVS)	njit-etd1995-054
Lin, Xin	MS	© 1995	*	Low pressure chemical vapor deposition of silicon nitride films from tridimethylaminosilane	njit-etd1995-093
Ravindranath, Chenna	MS	© 1995	*	Synthesis of boron nitride/vycor composite membrane structures by an optimized LPCVD process	njit-etd1995-030
Wang, Hong	MS	© 1995	*	The photolithographic patterning of porous silicon using silicon nitride and silicon carbide films as masks	njit-etd1995-117
Fan, Xiangqun	MS	© 1994	*	Low pressure chemical vapor deposition of silicon nitride films from ditertiarybutylsilane	njit-etd1994-081
Shilpee, Nazneen Karim	MS	© 1994		Artificial dielectric materials : synthesis and optical characterization of small metal clusters embedded in polymeric matrix	njit-etd1994-156
Yu, Gousinn	MS	© 1994	*	Laser treatment of ceramic coatings on defective ceramic glazed tile	njit-etd1994-146
Kuo, Wen-Pin	MS	© 1993	*	Synthesis and characterization of LPCVD boron nitride films for x-ray lithography	njit-etd1993-102
Yu, Yanyao	MS	© 1993	*	Synthesis and characterization of silicon nitride films deposited by plasma enhanced chemical vapor deposition using diethylsilane	njit-etd1993-168
Du, Xue	MS	© 1992		Characterization of low pressure chemical vapor deposited silicon dioxide thin films	njit-etd1992-037
Gorthy, Chakravarthy Srinivasa	MS	© 1992	*	Low temperature synthesis and characterization of LPCVD silicon dioxide films using diethylsilane	njit-etd1992-076
Bhaskaran, Mahalingam	MS	© 1991	*	Synthesis and characterization of LPCVD silicon carbide thin films for x-ray lithography	njit-etd1991-080
Loney, Norman W.	PhD	© 1991		Mathematical modeling of chemical vapor deposition processes and its application to thin film technology	njit-etd1991-001
Shi, Yi-Tong	MS	© 1991		Low pressure chemical vapor deposition (LPCVD) of silicon carbide from diethylsilane	njit-etd1991-069

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Created 4/12/01; updated 8/30/02, 06/30/05